Mda-400 UV Lithography Machine-Fornitore globale

D1-5, Chengwang Lidu South District, No.1 Xiangsi Lake East Road, Xixiangtang District, Nanning City, Guangxi Province

Product Name:

Mda-400 UV Lithography Machine

Product Introduction:

Brand:South Korean MIDAS

model:MDA-400M

Origin: South Korea

Price: negotiable

Product Description:

Also known as: mask alignment exposure machine, exposure system, lithography system, lithography machine, UV exposure machine, etc;
MIDAS is a leading global semiconductor equipment supplier, dedicated to the research and production of mask alignment lithography machines and homogenizers for many years, and widely used in the fields of semiconductors, microelectronics, biological devices, and nanotechnology; This company is one of the earliest companies in the world to commercialize lithography machines, with strong technical research and development capabilities and equipment production capabilities; And its equipment has been adopted by many famous enterprises, research centers, institutes, and universities; With excellent technology, exquisite craftsmanship, and excellent service, we have won the favor of users.
This model of lithography machine has the highest performance price ratio among all imported equipment, achieving the alignment accuracy of European and American brands. The CCD display screen alignment is more convenient, and the LCD touch screen operation uses Osram ultraviolet lamps, with a long service life. The overall effect is sturdy and durable.

Main features:
-The intensity of the light source is controllable;
-UV exposure, deep UV exposure (Option);
-System control: manual, semi-automatic, and fully automatic control;
-Exposure modes: vacuum contact mode (adjustable contact force), proximity mode, projection mode;
-Adjustable vacuum suction cup range;
-Patent technology: double-sided alignment, double-sided lithography, with IR and CCD modes
- Two CCD microscope systems with a maximum magnification of 1000 times, directly adjustable display screen, more convenient and efficient than traditional eyepiece alignment, and easy to operate.
-Special substrate chucks can be customized;
-Equipped with wedge-shaped compensation function;

Technical parameters:
-Substrate size: 4, 6, 8, 12, 25 inches, other sizes can be customized;
-Beam uniformity:< ±3%；
-Adjustable exposure time range: 0.1 to 999.9 seconds;
-Alignment accuracy: 0.6-1 micrometers
-Resolution: 1 micron;
-Beam output intensity: 15-25mW/cm2;

	project	technical specifications
Exposure System MDA-400M type	Light source power	350W UV Exposure Light source with Power supply
	resolution	- Vacuum Contact : 1um ( Thin PR@Si Wafer ) - Hard Contact : 1um - Soft contact : 2um - 20um Proximity: 5um
	Maximum beam size	4.25×4.25 inch
	Beam uniformity	≤ ±3% (4inch standard)
	beam intensity	15~20mW/cm² (365nm Intensity)
	The exposure time can be adjusted	0.1 to 999.9 sec
Alignment System	Alignment accuracy	1um
	Align gap	Manual adjustment (digital display)
	Lithography mode	Vacuum, hard contact, soft contact, proximity
	Chuck horizontal adjustment	Wedge Error Compensation
	Vacuum chuck movement	X, Y: 10 mm, Theta: ±5°
	Z-direction movement range	10mm
	Approaching to adjusting stride	1um
Sample	Base Substrate	2, 3, 4 inch
Sample	Mask template size	4 and 5 inch
Utilities	Vacuum	<-200 mbar (system includes vacuum pump)
	Compressed air CDA	> 5Kg/cm²
	Nitrogen N2	>3Kg/cm²
	Power Supply Electricity	220V, 15A, 1Phase
	Microscope and monitor CCD and Monitor	Dual CCD zoom microscope and LCD (17inch) monitor; Magnification : 80x ~ 1000x;